Optical and Electrical Properties of NiO Thin Films Deposited by DC Sputtering Technique
Abstract views: 187
/ 
PDF downloads: 98
Keywords:
Nickel oxide, Thin Film, Direct current sputtering, Electrical properties, Optical propertiesAbstract
In this study, Nickel Oxide (NiO) thin films were deposited on silicon and glass substrates
with different thicknesses by parameter optimization using the direct current (DC) sputtering technique.
The deposited NiO thin films were annealed for 30 min at different temperatures ranging from 30C to
330C. After annealing, the optical and electrical properties of NiO thin films were examined.
Characterizations were mainly carried out by ultraviolet–visible (UV/Vis) Spectrometer and four-point
probe (FPP) measurements. The minimum surface reflectance of 50 nm NiO film coated silicon substrate,
annealed at 135C for 30 min was 2.0% (at 550 nm) and the average surface reflectance was measured as
10.21% on the sample with 20 nm NiO thin film on the surface, annealed at 30C. In case of FFP
measurements, the minimum resistivity was measured as 0.01 ohmm when the thickness of NiO was 10 nm
and annealed at 30C. The maximum resistivity was observed as 4.19 ohmm on the 70 nm of NiO coated
glass and annealed at 330C for 30 min.
Downloads
References
Ai, L., Fang, G., Yuan, L., Liu, N., Wang, M., Li, C., Zhang, Q.,Li, J. and Zhao, X., Influence of substrate temperature on electrical and optical properties of p-type semitransparent conductive nickel oxide thin films deposited by radio frequency sputtering, Applied Surface Science, 254(8), pp. 2401-2405, 2008.
Meng, X., Gao, X., and Du, Y., Influence of O2/Ar flow ratio on the structure, optical and electrical properties of DC reactively magnetron-sputtered face-centered cubic NiO films at room temperature, Physica B: Condensed Matter, 579, 411877, 2020.
Dai, S., Bai, X., Wang, X., and Yan, X., Fabrication and super capacitive performance of nanoporous nickel oxide film, ChemistrySelect , 2(1), pp. 246–251, 2017.
Ahmed, A. A., Devarajan, M., and Afzal, N., Fabrication and characterization of high performance MSM UV photodetector based on NiO film. Sensors and Actuators A: Physical, 262, pp. 78-86, 2017.
Ahmmed, S., Aktar, A., Hossain, J., and Ismail, A. B. M., Enhancing the open circuit voltage of the SnS based heterojunction solar cell using NiO HTL. Solar Energy, 207, pp. 693-702, 2020.
Abdur, R., Choudhury, S., Bashar, M. S., Hossain, M. R., Quddus, M. S., Akhtar, U. S., Shaikh, M. A. A., Hossain, M. and Jamal, M. S., Enhancing perovskite solar cell performance: Investigating the impact of post-annealing on the optoelectrical and structural properties of RF-sputtered NiO films via SCAPS-1D device modeling. Solar Energy, 271, 112443, 2024.
Jlassi, M., Sta, I., Hajji, M., and Ezzaouia, H., NiO thin films synthesized by sol-gel: Potentiality for the realization of antireflection layer for silicon based solar cell applications. Surfaces and Interfaces, 6, pp. 218-222, 2017.
Peng, T. C., Xiao, X. H., Han, X. Y., Zhou, X. D., Wu, W., Ren, F. and Jiang, C. Z., Characterization of DC reactive magnetron sputtered NiO films using spectroscopic ellipsometry, Applied surface science, 257(13), pp. 5908-5912, 2011
Özkartal, A. and Noori, D. T., Effects of thermal annealing on the characterization of p-NiO/n-GaAs heterojunctions produced by thermal evaporation. Journal of Materials Science: Materials in Electronics, 32(10), pp. 13462-13471, 2021.
Roffi, T. M., Nozaki, S. and Uchida, K., Growth mechanism of single-crystalline NiO thin films grown by metal organic chemical vapor deposition, Journal of Crystal Growth, 451, pp. 57-64, 2016.
Mattox, D.M. Handbook of Physical Vapor Deposition (PVD) Processing; William Andrew: Norwich, NY, USA, 2010.
Sönmezoğlu S., Koç M., Akın S., İnce Film Üretim Teknikleri. Erciyes Üniversitesi Fen Bilimleri Enstitüsü Dergisi, 28(5), pp. 391-397, 2012.
Reddy, A. M., Reddy, A. S., Lee, K. S., and Reddy, P. S., Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering. Solid State Sciences, 13(2), pp. 314-320, 2011.
Reddy, A. M., Reddy, A. S., and Reddy, P. S., Annealing effect on the physical properties of dc reactive magnetron sputtered nickel oxide thin films. Physics Procedia, 49, pp. 9-14, 2013.
Kumar, M., Ansari, J. R., Srivastava, A. K., and Sharma, A., Influence of deposition and annealing temperature on resistivity and nanoindentation characteristics of reactive magnetic sputtered NiO films. Iran. J. Chem. Chem. Eng. Research Article, 42(10), pp. 3249-3256, 2023
